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Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)
- Authors
- Yang, Seolun; Park, H. -K.; Kim, J. -S.; Phark, S. -H.; Chang, Young Jun; Noh, T. W.; Hwang, H. -N.; Hwang, C. -C.; Kim, H. -D.
- Issue Date
- Oct-2013
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Ultrathin NiO film; Ag; Coulomb correlation energy; Charge transfer energy; Image charge potential; Polarization energy
- Citation
- SURFACE SCIENCE, v.616, pp 12 - 18
- Pages
- 7
- Journal Title
- SURFACE SCIENCE
- Volume
- 616
- Start Page
- 12
- End Page
- 18
- ISSN
- 0039-6028
1879-2758
- Abstract
- As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations. (C) 2013 Elsevier B.V. All rights reserved.
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Related Researcher
- Kim, Jae Sung
- 첨단소재·전자융합공학부 (신소재물리전공)