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Electron doping limit in Al-doped ZnO by donor-acceptor interactions

Authors
Noh, Ji-YoungKim, HanchulKim, Yong-SungPark, C. H.
Issue Date
Apr-2013
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.113, no.15
Journal Title
JOURNAL OF APPLIED PHYSICS
Volume
113
Number
15
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/11300
DOI
10.1063/1.4801533
ISSN
0021-8979
1089-7550
Abstract
We investigate the maximum available free electron carrier density in Al-doped n-type ZnO, based on density-functional theory calculations. The Coulomb interactions between the Al dopants and the Zn-vacancy native acceptors are found to limit the carrier density. In typical growth conditions, the n-type doping limit is found to be in the range of 10(19) similar to 10(21) cm(-3). (C) 2013 AIP Publishing LLC
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Kim, Han Chul
첨단소재·전자융합공학부 (신소재물리전공)
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