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Directionality of o-Phthalaldehyde adsorbed onto H-passiyated Si(100) Surface Characterized by NEXAFS and HRPES

Authors
Kim, Ki-jeongYang, SenaKang, Tai-HeeKim, BongsooLee, Hangil
Issue Date
Jul-2010
Publisher
WILEY-V C H VERLAG GMBH
Keywords
o-Phthalaldehyde; H-Si(100); HRPES; NEXAFS; 1-D Organic molecular line
Citation
BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.31, no.7, pp.1973 - 1975
Journal Title
BULLETIN OF THE KOREAN CHEMICAL SOCIETY
Volume
31
Number
7
Start Page
1973
End Page
1975
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/13167
DOI
10.5012/bkcs.2010.31.7.1973
ISSN
0253-2964
Abstract
The electronic and adsorption structure of o-phthalaldehyde (OPA) on the H-Si(100) surface was investigated by using Near Edge X-ray Fine Structure (NEXAFS) and high resolution photoemission spectroscopy (HRPES). We confirmed that the OPA grown on the H-Si(100) surface showed good dependency with about 60 degree tilting angle using NEXAFS and a single O 1s peak by using HRPES. Hydrogen atom passivated on the Si(100) surface was found to be a seed for making one dimensional organic line that uses a chain reaction as the H-Si(100) surface was compared with the hydrogen free Si(100) surface.
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