Substitutional Vanadium Sulfide Nanodispersed in MoS2 Film for Pt-Scalable Catalyst
- Authors
- Agyapong-Fordjour, Frederick Osei-Tutu; Yun, Seok Joon; Kim, Hyung-Jin; Choi, Wooseon; Kirubasankar, Balakrishnan; Choi, Soo Ho; Adofo, Laud Anim; Boandoh, Stephen; Kim, Yong In; Kim, Soo Min; Kim, Young-Min; Lee, Young Hee; Han, Young-Kyu; Kim, Ki Kang
- Issue Date
- Aug-2021
- Publisher
- WILEY
- Keywords
- first-principles calculations; hydrogen evolution; molybdenum disulfide; transition metal dichalcogenides; vanadium disulfide
- Citation
- ADVANCED SCIENCE, v.8, no.16, pp 1 - 8
- Pages
- 8
- Journal Title
- ADVANCED SCIENCE
- Volume
- 8
- Number
- 16
- Start Page
- 1
- End Page
- 8
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/146496
- DOI
- 10.1002/advs.202003709
- ISSN
- 2198-3844
2198-3844
- Abstract
- Among transition metal dichalcogenides (TMdCs) as alternatives for Pt-based catalysts, metallic-TMdCs catalysts have highly reactive basal-plane but are unstable. Meanwhile, chemically stable semiconducting-TMdCs show limiting catalytic activity due to their inactive basal-plane. Here, metallic vanadium sulfide (VSn) nanodispersed in a semiconducting MoS2 film (V-MoS2) is proposed as an efficient catalyst. During synthesis, vanadium atoms are substituted into hexagonal monolayer MoS2 to form randomly distributed VSn units. The V-MoS2 film on a Cu electrode exhibits Pt-scalable catalytic performance; current density of 1000 mA cm(-2) at 0.6 V and overpotential of -0.08 V at a current density of 10 mA cm(-2) with excellent cycle stability for hydrogen-evolution-reaction (HER). The high intrinsic HER performance of V-MoS2 is explained by the efficient electron transfer from the Cu electrode to chalcogen vacancies near vanadium sites with optimal Gibbs free energy (-0.02 eV). This study provides insight into ways to engineer TMdCs at the atomic-level to boost intrinsic catalytic activity for hydrogen evolution.
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