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Phonon conduction in silicon nanobeams

Authors
Park, WoosungShin, Dongsuk D.Kim, Soo JinKatz, Joseph S.Park, JoonsukAhn, Chae HyuckKodama, TakashiAsheghi, MehdiKenny, Thomas W.Goodson, Kenneth E.
Issue Date
May-2017
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.110, no.21
Journal Title
APPLIED PHYSICS LETTERS
Volume
110
Number
21
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/146990
DOI
10.1063/1.4983790
ISSN
0003-6951
1077-3118
Abstract
Despite extensive studies on thermal transport in thin silicon films, there has been little work studying the thermal conductivity of single-crystal rectangular, cross-sectional nanobeams that are commonly used in many applications such as nanoelectronics (FinFETs), nano-electromechanical systems, and nanophotonics. Here, we report experimental data on the thermal conductivity of silicon nanobeams of a thickness of similar to 78 nm and widths of similar to 65 nm, 170 nm, 270 nm, 470 nm, and 970 nm. The experimental data agree well (within similar to 9%) with the predictions of a thermal conductivity model that uses a combination of bulk mean free paths obtained from ab initio calculations and a suppression function derived from the kinetic theory. This work quantifies the impact of nanobeam aspect ratios on thermal transport and establishes a criterion to differentiate between thin films and beams in studying thermal transport. The thermal conductivity of a 78 nm similar to 65 nm nanobeam is similar to 32 W m(-1) K-1, which is roughly a factor of two smaller than that of a 78 nm thick film. Published by AIP Publishing.
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공과대학 > 기계시스템학부 > 1. Journal Articles

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