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Nanoscale imaging and control of resistance switching in VO2 at room temperature

Authors
Kim, J (Kim, Jeehoon)Ko, C (Ko, Changhyun)Frenzel, A (Frenzel, Alex)Ramanathan, S (Ramanathan, ShrHoffman, JE (Hoffman, Jennifer
Issue Date
May-2010
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.96, no.21
Journal Title
APPLIED PHYSICS LETTERS
Volume
96
Number
21
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/147931
DOI
10.1063/1.3435466
ISSN
0003-6951
1077-3118
Abstract
We demonstrate controlled local phase switching of a VO2 film using a biased conducting atomic force microscope tip. After application of an initial, higher "training" voltage, the resistance transition is hysteretic with IV loops converging upon repeated voltage sweep. The threshold V-set to initiate the insulator-to-metal transition is on order similar to 5 V at room temperature, and increases at low temperature. We image large variations in V-set from grain to grain. Our imaging technique opens up the possibility for an understanding of the microscopic mechanism of phase transition in VO2 as well as its potential relevance to solid state devices. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3435466]
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첨단소재·전자융합공학부 (신소재물리전공)
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