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Chemically abrupt interface between Ce oxide and Fe films

Authors
Lee, HGLee, DKim, SKim, SGHwang, CY
Issue Date
Dec-2005
Publisher
ELSEVIER SCIENCE BV
Citation
APPLIED SURFACE SCIENCE, v.252, no.5, pp 1202 - 1205
Pages
4
Journal Title
APPLIED SURFACE SCIENCE
Volume
252
Number
5
Start Page
1202
End Page
1205
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/148707
DOI
10.1016/j.apsusc.2005.03.129
ISSN
0169-4332
1873-5584
Abstract
A chemically abrupt Fe/Ce oxide interface can be formed by initial oxidation of an Fe film followed by deposition of Cc metal. Once a Cc oxide layer is formed on top of Fe, it acts a passivation barrier for oxygen diffusion. Further deposition of Cc metal followed by its oxidation preserve the abrupt interface between Ce oxide and Fe films. The Fe and Cc oxidation states have been monitored at each stage using X-ray photoelectron spectroscopy. (c) 2005 Elsevier B.V. All rights reserved.
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