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Magnetization switching of NiFeSiB free layers for magnetic tunnel junctions

Authors
Chun, B. S.Ko, S. P.Oh, B. S.Hwang, J. Y.Rhee, J. R.Kim, T. W.Saito, S.Yoshimura, S.Tsunoda, M.Takahashi, M.Kim, Y. K.
Issue Date
Sep-2006
Publisher
ELSEVIER SCIENCE BV
Keywords
Magnetic tunnel junctions; Amorphous ferromagnet; NiFeSiB film
Citation
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.304, no.1, pp E258 - E260
Journal Title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume
304
Number
1
Start Page
E258
End Page
E260
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/15077
DOI
10.1016/j.jmmm.2006.02.052
ISSN
0304-8853
1873-4766
Abstract
Ferromagnetic amorphous Ni16Fe62Si8B14 layer have been studied as free layers for magnetic tunnel junctions (MTJs) to enhance cell switching performance. Traditional MTJ free layer materials such as NiFe and CoFe were also prepared for switching comparison purposes. Both NiFeSiB and NiFe resulted in an order of magnitude smaller switching fields compared to the CoFe. The switching field was further reduced for the synthetic antiferromagnetic NiFeSiB free layered structure. (C) 2006 Elsevier B.V. All rights reserved.
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