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Fabrication and characteristics of magnetic tunnel transistors using amorphous n-type Si films

Authors
Lee, SSLee, JYKim, MSChoi, JGHwang, DGRhie, KRhee, JR
Issue Date
Jun-2004
Publisher
WILEY-V C H VERLAG GMBH
Citation
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, v.241, no.7, pp 1498 - 1501
Pages
4
Journal Title
PHYSICA STATUS SOLIDI B-BASIC RESEARCH
Volume
241
Number
7
Start Page
1498
End Page
1501
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/15869
DOI
10.1002/pssb.200404592
ISSN
0370-1972
1521-3951
Abstract
A magnetic tunnel transistor (MTT) device using an amorphous n-type Si semiconductor film for the base and collector consisting of [CoFe/NiFe] (free layer) and Si (top layer) multilayers is used to study the spin-dependent hot electron magnetocurrent (MC) and the tunneling magnetoresistance at room temperature. A large MC of more than 40.2% is observed at the emitter-base bias voltage V-BE of 0.62 V. The increasing emitter hot current and transfer ratio with the increase of the emitter-base voltage are due mainly to a rapid creation of a number of conduction-band states in the Si collector. However, above a V-BE of 0.62 V, a rapid decrease of the MC is observed in an amorphous Si-based MTT. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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