Fabrication and characteristics of magnetic tunnel transistors using amorphous n-type Si films
- Authors
- Lee, SS; Lee, JY; Kim, MS; Choi, JG; Hwang, DG; Rhie, K; Rhee, JR
- Issue Date
- Jun-2004
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- PHYSICA STATUS SOLIDI B-BASIC RESEARCH, v.241, no.7, pp 1498 - 1501
- Pages
- 4
- Journal Title
- PHYSICA STATUS SOLIDI B-BASIC RESEARCH
- Volume
- 241
- Number
- 7
- Start Page
- 1498
- End Page
- 1501
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/15869
- DOI
- 10.1002/pssb.200404592
- ISSN
- 0370-1972
1521-3951
- Abstract
- A magnetic tunnel transistor (MTT) device using an amorphous n-type Si semiconductor film for the base and collector consisting of [CoFe/NiFe] (free layer) and Si (top layer) multilayers is used to study the spin-dependent hot electron magnetocurrent (MC) and the tunneling magnetoresistance at room temperature. A large MC of more than 40.2% is observed at the emitter-base bias voltage V-BE of 0.62 V. The increasing emitter hot current and transfer ratio with the increase of the emitter-base voltage are due mainly to a rapid creation of a number of conduction-band states in the Si collector. However, above a V-BE of 0.62 V, a rapid decrease of the MC is observed in an amorphous Si-based MTT. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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