Exchange biasing in NiFe/FeMn/NiFe with Si seed and capping layers
- Authors
- Hwang, D. G.; Kim, S. W.; Kim, B. K.; Lee, J. Y.; Kim, J. K.; Rhee, J. R.; Lee, S. S.
- Issue Date
- May-2004
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Si seed; exchange biasing field; crystal texture; annealing; silicide
- Citation
- JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.272-276, no.Supplement, pp E1417 - E1419
- Journal Title
- JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
- Volume
- 272-276
- Number
- Supplement
- Start Page
- E1417
- End Page
- E1419
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/15882
- DOI
- 10.1016/j.jmmm.2003.12.723
- ISSN
- 0304-8853
1873-4766
- Abstract
- NiFe/FeMn/NiFe multilayers with Si (Ta) seed and capping layers were prepared through ion beam deposition. The exchange biasing field (H-ex) of the multilayer with Si increased more than that of Ta, with the crystalline (1 1 1) texture dominant. The H-ex of the Si layer doubled at 200 degrees C, although it disappeared at 250 degrees C due to silicide formation at the Si/NiFe interface. To obtain the improved thermal property of the Si seed multilayer, the temperature dependence of the crystal texture of the Si/(NiFe, Co, CoFe) bilayer was investigated along with the annealing process. (C) 2003 Elsevier B. V. All rights reserved.
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