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Exchange biasing in NiFe/FeMn/NiFe with Si seed and capping layers

Authors
Hwang, D. G.Kim, S. W.Kim, B. K.Lee, J. Y.Kim, J. K.Rhee, J. R.Lee, S. S.
Issue Date
May-2004
Publisher
ELSEVIER SCIENCE BV
Keywords
Si seed; exchange biasing field; crystal texture; annealing; silicide
Citation
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.272-276, no.Supplement, pp E1417 - E1419
Journal Title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume
272-276
Number
Supplement
Start Page
E1417
End Page
E1419
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/15882
DOI
10.1016/j.jmmm.2003.12.723
ISSN
0304-8853
1873-4766
Abstract
NiFe/FeMn/NiFe multilayers with Si (Ta) seed and capping layers were prepared through ion beam deposition. The exchange biasing field (H-ex) of the multilayer with Si increased more than that of Ta, with the crystalline (1 1 1) texture dominant. The H-ex of the Si layer doubled at 200 degrees C, although it disappeared at 250 degrees C due to silicide formation at the Si/NiFe interface. To obtain the improved thermal property of the Si seed multilayer, the temperature dependence of the crystal texture of the Si/(NiFe, Co, CoFe) bilayer was investigated along with the annealing process. (C) 2003 Elsevier B. V. All rights reserved.
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