Nanopatterning by ion beam sputtering in unconventional formats
- Authors
- Kim, J-H; Yoon, S M; Jo, Sujin; Seo, J; Kim, J-S
- Issue Date
- Jul-2018
- Publisher
- Institute of Physics Publishing
- Keywords
- nanopatterning; ion beam; sputtering; sequential ion beam sputtering; swing during ion beam sputtering; dual ion beam sputtering; rocking during ion beam sputtering
- Citation
- Journal of Physics Condensed Matter, v.30, no. 27
- Journal Title
- Journal of Physics Condensed Matter
- Volume
- 30
- Number
- 27
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/4436
- DOI
- 10.1088/1361-648X/aac7d7
- ISSN
- 0953-8984
1361-648X
- Abstract
- Nanopatterning at solid surfaces by ion beam sputtering (IBS) has been practiced mostly for stationary substrates with an ion beam incident under a fixed sputter geometry. We have released such constraints in the sputter condition. We simultaneously apply two ion beams or sequentially vary the orientation of substrate with respect to an ion beam. We also periodically change either the azimuthal or polar angle of the substrate with respect to an ion beam during IBS. These unconventional ways of IBS can improve the order of the pattern, and produce novel and non trivial nano patterns that well serve as touch stones to refine the theoretical models and thus deepen our understanding of the patterning mechanisms by IBS.
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