Oxygen Partial Pressure during Pulsed Laser Deposition: Deterministic Role on Thermodynamic Stability of Atomic Termination Sequence at SrRuO3/BaTiO3 Interface
- Authors
- Shin, Yeong Jae; Wang, Lingfei; Kim, Yoonkoo; Nahm, Ho-Hyun; Lee, Daesu; Kim, Jeong Rae; Yang, San Mo; Yoon, Jong-Gul; Chung, Jin-Seok; Kim, Miyoung; Chang, Seo Hyoung; Noh, Tae Won
- Issue Date
- Aug-2017
- Publisher
- AMER CHEMICAL SOC
- Keywords
- ferroelectric; interface engineering; oxide heterostructure; pulsed laser deposition; thermodynamic surface stability
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.9, no.32, pp 27305 - 27312
- Pages
- 8
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 9
- Number
- 32
- Start Page
- 27305
- End Page
- 27312
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/8224
- DOI
- 10.1021/acsami.7b07813
- ISSN
- 1944-8244
1944-8252
- Abstract
- With recent trends on miniaturizing oxide-baed devices, the need for atomic-scale control of surface/interface structures by pulsed laser deposition (PLD) has increased. In particular, realizing uniform atomic termination at the surface/ interface is highly desirable. However, a lack of understanding on the surface formation mechanism in PLD has limited a deliberate control of surface/interface atomic stacking sequences. Here, taking the prototypical-SrRuO3/BaTiO3/SrRuO3 (SRO/BTO/SRO) heterostructure as a model system, we investigated the formation of different interfacial termination sequences (BaO-RuO2 or TiO2-SrO) with oxygen partial pressure (PO2) during PLD. We found that a uniform SrO TiO2 termination sequence at the SRO/BTO interface can be achieved by lowering the Po-2 to 5 mTorr, regardless of the total background gas pressure (P-total), growth mode, or growth rate. Our results indicate that the thermodynamic stability of the BTO surface at the low-energy kinetics stage of PLD can play an important role in surface/interface termination formation. This work paves the way for realizing termination engineering in functional oxide heterostructures.
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