상세 보기
초록
Ultrathin NiO filins are grown on Ag(001) under well-defined conditions with careful control over both O(2) and H(2)O partial pressures and substrate temperatures. Chemical defects in the NiO films are unambiguously identified and characterized by high resolution x-ray photoelectron spectroscopy of O 1s and Ni 2p states using synchrotron radiatiou. Based on correlations between growth conditions and the presence of defects, optimum growth conditions are suggested for the formation of NiO filius on Ag(001) that are free from chemical defects.
키워드
NiO; Ag; Ultrathin film; Water; Defects; X-RAY PHOTOELECTRON; OXIDE SURFACES; THIN-FILMS; NICKEL; GROWTH; XPS; SPECTROSCOPY; WATER; PHOTOEMISSION; OXIDATION
- 제목
- Chemical Defects in Ultrathin NiO Films on Ag(001)
- 저자
- Yang, Seolun; Kim, Jae-Sung
- 발행일
- 2010-02
- 유형
- Article
- 권
- 56
- 호
- 2
- 페이지
- 659 ~ 665