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Two-Dimensional Carbon Incorporation into Si(001): C Amount and Structure of Si(001)-c(4x4)
- Hanchul Kim;
- Wondong Kim;
- Geunseop Lee;
- Ja-Yong Koo
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27초록
The C amount and the structure of the Si001-c4 4 surface is studied using scanning tunneling microscopy (STM) and ab initio calculations. The c4 4 phase is found to contain 1=8 monolayer C (1 C atom in each primitive unit cell). From the C amount and the symmetry of high-resolution STM images, it is inferred that the C atoms substitute the fourth-layer site below the dimer row. We construct a structure model relying on ab initio energetics and STM simulations. Each C atom induces an on-site dimer vacancy and two adjacent rotated dimers on the same dimer row. The c4 4 phase constitutes the subsurface Si0:875C0:125 layer with two-dimensionally ordered C atoms.
- 제목
- Two-Dimensional Carbon Incorporation into Si(001): C Amount and Structure of Si(001)-c(4x4)
- 저자
- Hanchul Kim; Wondong Kim; Geunseop Lee; Ja-Yong Koo
- 발행일
- 2005-02
- 권
- 94
- 호
- 7
- 페이지
- 1 ~ 4
- 언어
- ENG
- 출판사
- The American Physical Society
- 발행국가
- 미국
- 분량
- 4 페이지
- ISSN
- P 0031-9007