Graphene Oxide-Supported Microwell Grids for Preparing Cryo-EM Samples with Controlled Ice Thickness
  • Kang, Min-Ho
  • Park, Junsun
  • Kang, Sungsu
  • Jeon, Sungho
  • Lee, Minyoung
  • ... Lim, Kwang-Il
  • 외 12명
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초록

Cryogenic-electron microscopy (cryo-EM) is the preferred method to determine 3D structures of proteins and to study diverse material systems that intrinsically have radiation or air sensitivity. Current cryo-EM sample preparation methods provide limited control over the sample quality, which limits the efficiency and high throughput of 3D structure analysis. This is partly because it is difficult to control the thickness of the vitreous ice that embeds specimens, in the range of nanoscale, depending on the size and type of materials of interest. Thus, there is a need for fine regulation of the thickness of vitreous ice to deliver consistent high signal-to-noise ratios for low-contrast biological specimens. Herein, an advanced silicon-chip-based device is developed which has a regular array of micropatterned holes with a graphene oxide (GO) window on freestanding silicon nitride (SixNy). Accurately regulated depths of micropatterned holes enable precise control of vitreous ice thickness. Furthermore, GO window with affinity for biomolecules can facilitate concentration of the sample molecules at a higher level. Incorporation of micropatterned chips with a GO window enhances cryo-EM imaging for various nanoscale biological samples including human immunodeficiency viral particles, groEL tetradecamers, apoferritin octahedral, aldolase homotetramer complexes, and tau filaments, as well as inorganic materials.

키워드

cryogenic-electron microscopegraphene oxidemicroelectromechanical systemsnanomaterialsvitreous ice thicknessSILICON-NITRIDEATOMIC-STRUCTUREGAS SENSORRESOLUTIONLPCVDWATER
제목
Graphene Oxide-Supported Microwell Grids for Preparing Cryo-EM Samples with Controlled Ice Thickness
저자
Kang, Min-HoPark, JunsunKang, SungsuJeon, SunghoLee, MinyoungShim, Ji-YeonLee, JeeyoungJeon, Tae JinAhn, Min KyungLee, Sung MiKwon, OhkyungKim, Byung HyoMeyerson, Joel R.Lee, Min JaeLim, Kwang-IlRoh, Soung-HunLee, Won ChulPark, Jungwon
DOI
10.1002/adma.202102991
발행일
2021-10
유형
Article
저널명
Advanced Materials
33
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