Ferroelectricity in epitaxial Y-doped HfO2 thin film integrated on Si substrate
  • Lee, K.
  • Lee, T. Y.
  • Yang, S. M.
  • Lee, D. H.
  • Park, J.
  • 외 1명
Citations

WEB OF SCIENCE

44
Citations

SCOPUS

47

초록

We report on the ferroelectricity of a Y-doped HfO2 thin film epitaxially grown on Si substrate, with an yttria-stabilized zirconia buffer layer pre-deposited on the substrate. Piezoresponse force microscopy results show the ferroelectric domain pattern, implying the existence of ferroelectricity in the epitaxial HfO2 film. The epitaxially stabilized HfO2 film in the form of a metal-ferroelectric-insulator-semiconductor structure exhibits ferroelectric hysteresis with a clear ferroelectric switching current in polarization-voltage measurements. The HfO2 thin film also demonstrates ferroelectric retention comparable to that of current perovskite-based metal-ferroelectric-insulator-semiconductor structures. Published by AIP Publishing.

키워드

YTTRIA-STABILIZED ZIRCONIADOMAIN DYNAMICSLONG-RETENTIONPOLARIZATION
제목
Ferroelectricity in epitaxial Y-doped HfO2 thin film integrated on Si substrate
저자
Lee, K.Lee, T. Y.Yang, S. M.Lee, D. H.Park, J.Chae, S. C.
DOI
10.1063/1.5020688
발행일
2018-05
유형
Article
저널명
Applied Physics Letters
112
20