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초록
We used X-ray photoelectron spectroscopy of O 1s to study water-derived chemical defects in ultrathin NiO films grown on Ag(001) by. Special attention was paid to growing the NiO films under well-defined H2O partial pressures and substrate temperatures. Consistent analysis of the spectroscopic features of the NiO films allowed us to unambiguously identify water-derived chemical defects such as NiO-OH, Ni(OH)(2) and ice in the NiO film.
키워드
NiO; Ag; ultrathin film; water; defects; NICKEL; METAL; XPS; OXIDATION; SURFACES; AG(001)
- 제목
- Effects of residual water molecules on growth of NiO films on Ag(100)
- 저자
- Yang, Seolun; Kim, J. -S.
- 발행일
- 2008-02
- 유형
- Article
- 권
- 52
- 호
- 2
- 페이지
- 532 ~ 535