Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Yang, Seolun; Park, H. -K.; Kim, J. -S.; Phark, S. -H.; Chang, Young Jun; Noh, T. W.; Hwang, H. -N.; Hwang, C. -C.; Kim, H. -D.

doi:10.1016/j.susc.2013.05.012

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Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Yang, Seolun;
Park, H. -K.;
Kim, J. -S.;
Phark, S. -H.;
Chang, Young Jun;
외 4명

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5

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6

초록

As the film becomes atomically thin, the on-site Coulomb interaction energy between two 3p holes of the NiO films on Ag(001) U (Ni 3p) significantly decreases as revealed by both X-ray photoelectron and Auger electron spectroscopies. The reduction of U (Ni 3p) for the ultrathin films is well accounted for by varied image potentials and polarization energies in the films from their bulk values. The present results confirm a previous model predicting the reduction of charge fluctuation energies in ultrathin oxide films on highly polarizable substrates due to the extra-atomic relaxations. (C) 2013 Elsevier B.V. All rights reserved.

키워드

Ultrathin NiO film; Ag; Coulomb correlation energy; Charge transfer energy; Image charge potential; Polarization energy; ION SHELL-MODEL; ELECTRONIC-STRUCTURE; NIO(001) SURFACE; GROWTH; LEED

제목: Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

저자: Yang, Seolun; Park, H. -K.; Kim, J. -S.; Phark, S. -H.; Chang, Young Jun; Noh, T. W.; Hwang, H. -N.; Hwang, C. -C.; Kim, H. -D.

DOI: 10.1016/j.susc.2013.05.012

발행일: 2013-10

유형: Article

저널명: Surface Science

권: 616

페이지: 12 ~ 18

언어: ENG

출판사: ELSEVIER SCIENCE BV

발행국가: 네덜란드

분량: 7 페이지

ISSN: E 1879-2758
P 0039-6028