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Phonon conduction in silicon nanobeams

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dc.contributor.authorPark, Woosung-
dc.contributor.authorShin, Dongsuk D.-
dc.contributor.authorKim, Soo Jin-
dc.contributor.authorKatz, Joseph S.-
dc.contributor.authorPark, Joonsuk-
dc.contributor.authorAhn, Chae Hyuck-
dc.contributor.authorKodama, Takashi-
dc.contributor.authorAsheghi, Mehdi-
dc.contributor.authorKenny, Thomas W.-
dc.contributor.authorGoodson, Kenneth E.-
dc.date.accessioned2022-04-19T09:44:58Z-
dc.date.available2022-04-19T09:44:58Z-
dc.date.issued2017-05-
dc.identifier.issn0003-6951-
dc.identifier.issn1077-3118-
dc.identifier.urihttps://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/146990-
dc.description.abstractDespite extensive studies on thermal transport in thin silicon films, there has been little work studying the thermal conductivity of single-crystal rectangular, cross-sectional nanobeams that are commonly used in many applications such as nanoelectronics (FinFETs), nano-electromechanical systems, and nanophotonics. Here, we report experimental data on the thermal conductivity of silicon nanobeams of a thickness of similar to 78 nm and widths of similar to 65 nm, 170 nm, 270 nm, 470 nm, and 970 nm. The experimental data agree well (within similar to 9%) with the predictions of a thermal conductivity model that uses a combination of bulk mean free paths obtained from ab initio calculations and a suppression function derived from the kinetic theory. This work quantifies the impact of nanobeam aspect ratios on thermal transport and establishes a criterion to differentiate between thin films and beams in studying thermal transport. The thermal conductivity of a 78 nm similar to 65 nm nanobeam is similar to 32 W m(-1) K-1, which is roughly a factor of two smaller than that of a 78 nm thick film. Published by AIP Publishing.-
dc.language영어-
dc.language.isoENG-
dc.publisherAMER INST PHYSICS-
dc.titlePhonon conduction in silicon nanobeams-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1063/1.4983790-
dc.identifier.scopusid2-s2.0-85019684392-
dc.identifier.wosid000402320000033-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.110, no.21-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume110-
dc.citation.number21-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.urlhttps://aip.scitation.org/doi/10.1063/1.4983790-
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