Enhancement of minority carrier injection in ambipolar carbon nanotube transistors using double-gate structures
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Bongjun | - |
dc.contributor.author | Liang, Kelly | - |
dc.contributor.author | Geier, Michael L. | - |
dc.contributor.author | Hersam, Mark C. | - |
dc.contributor.author | Dodabalapur, Ananth | - |
dc.date.accessioned | 2022-04-19T09:47:06Z | - |
dc.date.available | 2022-04-19T09:47:06Z | - |
dc.date.issued | 2016-07 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.issn | 1077-3118 | - |
dc.identifier.uri | https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/147047 | - |
dc.description.abstract | We show that double-gate ambipolar thin-film transistors can be operated to enhance minority carrier injection. The two gate potentials need to be significantly different for enhanced injection to be observed. This enhancement is highly beneficial in devices such as light-emitting transistors where balanced electron and hole injections lead to optimal performance. With ambipolar single-walled carbon nanotube semiconductors, we demonstrate that higher ambipolar currents are attained at lower source-drain voltages, which is desired for portable electronic applications, by employing double-gate structures. In addition, when the two gates are held at the same potential, the expected advantages of the double-gate transistors such as enhanced on-current are also observed. Published by AIP Publishing. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | Enhancement of minority carrier injection in ambipolar carbon nanotube transistors using double-gate structures | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1063/1.4958851 | - |
dc.identifier.scopusid | 2-s2.0-84978698930 | - |
dc.identifier.wosid | 000381155200069 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.109, no.2, pp 1 - 5 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 109 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 5 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.url | https://aip.scitation.org/doi/10.1063/1.4958851 | - |
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