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Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern

Authors
Lim, HSHan, JTKwak, DJin, MHCho, K
Issue Date
Nov-2006
Publisher
AMER CHEMICAL SOC
Citation
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.128, no.45, pp 14458 - 14459
Pages
2
Journal Title
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume
128
Number
45
Start Page
14458
End Page
14459
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/148653
DOI
10.1021/ja0655901
ISSN
0002-7863
1520-5126
Abstract
We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces.
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공과대학 (화공생명공학부)
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