Temporal evolution of the chemical structure during the pattern transfer by ion-beam sputtering
- Authors
- Ha, N. -B.; Jeong, S.; Yu, S.; Ihm, H. -I.; Kim, J. -S.
- Issue Date
- Jan-2015
- Publisher
- ELSEVIER
- Keywords
- Ru; Si; Metallic glass; Ion beam sputtering; Nano patterning
- Citation
- APPLIED SURFACE SCIENCE, v.324, pp 240 - 244
- Pages
- 5
- Journal Title
- APPLIED SURFACE SCIENCE
- Volume
- 324
- Start Page
- 240
- End Page
- 244
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/10715
- DOI
- 10.1016/j.apsusc.2014.10.053
- ISSN
- 0169-4332
1873-5584
- Abstract
- Ru films patterned by ion-beam sputtering (IBS) serve as sacrificial masks for the transfer of the patterns to Si(1 0 0) and metallic glass substrates by continued IBS. Under the same sputter condition, however, both bare substrates remain featureless. Chemical analyses of the individual nano structures simultaneously with the investigation of their morphological evolution reveal that the pattern transfer, despite its apparent success, suffers from premature degradation before the mask is fully removed by IBS. Moreover, the residue of the mask or Ru atoms stubbornly remains near the surface, resulting in unintended doping or alloying of both patterned substrates. (C) 2014 Elsevier B.V. All rights reserved.
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