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Electronic structure of p(2 × 3) Ag films on Si(100)

Authors
Kim, Soon-KiKim, Jae-SungLee, GeunseopNogami, JunKong, Ki-jeongYu, Byung DeokAhn, Doyeol
Issue Date
Jan-2013
Publisher
KOREAN PHYSICAL SOC
Keywords
Ag; Si(100); Electronics structure; EELS; First principles calculations
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.62, no.1, pp 86 - 91
Pages
6
Journal Title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume
62
Number
1
Start Page
86
End Page
91
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/11383
DOI
10.3938/jkps.62.86
ISSN
0374-4884
1976-8524
Abstract
The electronic structure of p(2 x 3) Ag films on Si(100) is studied by using electron energy loss spectroscopy (EELS) and scanning tunneling spectroscopy (STS). We observe three energy loss peaks with their loss energies around 1.28, 1.63, and 4.0 eV, respectively. They are assigned to the interband transition in the p(2x3) islands, the interface plasmon between Si(100) and Ag crystallites formed concomitantly with the p(2 x 3) islands, and a combination of the surface plasmon and interband transition of the Ag crystallites, respectively. STS over the p(2 x 3) surface also reveals a band gap around 1 eV in good agreement with the EELS observation of the interband transition. The present observation of the band gap suggests that the p(2 x 3) surface is semiconducting. Furthermore, we examine two models previously proposed for the p(2 x 3) surface against the present experimental observation by ab initio band structure calculations.
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Kim, Jae Sung
첨단소재·전자융합공학부 (신소재물리전공)
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