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Stereoselective Attachment via N Dative Bonding: S-Proline on Ge(100)

Authors
Youn, Young-SangKim, Ki-JeongKim, BongsooKim, Do HwanLee, HangilKim, Sehun
Issue Date
Jan-2011
Publisher
AMER CHEMICAL SOC
Citation
JOURNAL OF PHYSICAL CHEMISTRY C, v.115, no.3, pp 710 - 713
Pages
4
Journal Title
JOURNAL OF PHYSICAL CHEMISTRY C
Volume
115
Number
3
Start Page
710
End Page
713
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/12698
DOI
10.1021/jp109633m
ISSN
1932-7447
1932-7455
Abstract
The adsorption configurations of S-proline on Ge(100) were studied using scanning tunneling microscopy (STM), density functional theory (DFT) calculations, and high-resolution photoemission spectroscopy (HRPES). We identified three adsorption structures of S-proline on Ge(100) through analysis of the STM images, DFT calculations, and HRPES results: (i) an "intrarow O-H dissociated and N dative bonded structure", (ii) an "O-H dissociation structure", and (iii) an "N dative bonded structure". Moreover, because adsorption through the N atom of S-proline creates a new chiral center due to symmetry reduction produced by N dative bonding with the surface, the adsorption configurations of S-proline on Ge(100) have either (R,S) or (S,S) chirality. Through DFT calculations, we clearly demonstrated that the adsorption configurations have (R,S) chirality with a preference for reaction at the Re face. This work presents a novel method for generating stereoselective attachment using S-proline molecules adsorbed on a Ge(100) surface.
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