Stereoselective Attachment via N Dative Bonding: S-Proline on Ge(100)
- Authors
- Youn, Young-Sang; Kim, Ki-Jeong; Kim, Bongsoo; Kim, Do Hwan; Lee, Hangil; Kim, Sehun
- Issue Date
- Jan-2011
- Publisher
- AMER CHEMICAL SOC
- Citation
- JOURNAL OF PHYSICAL CHEMISTRY C, v.115, no.3, pp 710 - 713
- Pages
- 4
- Journal Title
- JOURNAL OF PHYSICAL CHEMISTRY C
- Volume
- 115
- Number
- 3
- Start Page
- 710
- End Page
- 713
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/12698
- DOI
- 10.1021/jp109633m
- ISSN
- 1932-7447
1932-7455
- Abstract
- The adsorption configurations of S-proline on Ge(100) were studied using scanning tunneling microscopy (STM), density functional theory (DFT) calculations, and high-resolution photoemission spectroscopy (HRPES). We identified three adsorption structures of S-proline on Ge(100) through analysis of the STM images, DFT calculations, and HRPES results: (i) an "intrarow O-H dissociated and N dative bonded structure", (ii) an "O-H dissociation structure", and (iii) an "N dative bonded structure". Moreover, because adsorption through the N atom of S-proline creates a new chiral center due to symmetry reduction produced by N dative bonding with the surface, the adsorption configurations of S-proline on Ge(100) have either (R,S) or (S,S) chirality. Through DFT calculations, we clearly demonstrated that the adsorption configurations have (R,S) chirality with a preference for reaction at the Re face. This work presents a novel method for generating stereoselective attachment using S-proline molecules adsorbed on a Ge(100) surface.
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