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Effects of residual water molecules on growth of NiO films on Ag(100)
- Authors
- Yang, Seolun; Kim, J. -S.
- Issue Date
- Feb-2008
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- NiO; Ag; ultrathin film; water; defects
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.52, no.2, pp 532 - 535
- Pages
- 4
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 52
- Number
- 2
- Start Page
- 532
- End Page
- 535
- ISSN
- 0374-4884
1976-8524
- Abstract
- We used X-ray photoelectron spectroscopy of O 1s to study water-derived chemical defects in ultrathin NiO films grown on Ag(001) by. Special attention was paid to growing the NiO films under well-defined H2O partial pressures and substrate temperatures. Consistent analysis of the spectroscopic features of the NiO films allowed us to unambiguously identify water-derived chemical defects such as NiO-OH, Ni(OH)(2) and ice in the NiO film.
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Related Researcher
- Kim, Jae Sung
- 첨단소재·전자융합공학부 (신소재물리전공)