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Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer

Authors
Park, JaeyoonPark, MinwooJeong, Unyong
Issue Date
Mar-2014
Publisher
WILEY-V C H VERLAG GMBH
Citation
MACROMOLECULAR RAPID COMMUNICATIONS, v.35, no.5, pp 560 - 565
Pages
6
Journal Title
MACROMOLECULAR RAPID COMMUNICATIONS
Volume
35
Number
5
Start Page
560
End Page
565
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/147343
DOI
10.1002/marc.201300787
ISSN
1022-1336
1521-3927
Abstract
This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In2O3 <boxed-text content-type="graphic" position="anchor"> <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="urn:x-wiley:10221336:media:marc201300787:marc201300787-abs-0001">image</graphic
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공과대학 > 화공생명공학부 > 1. Journal Articles

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공과대학 (화공생명공학부)
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