Suppressing Instability of Liquid Thin Films by a Fibril Network and its Application to Micropatterning without a Residual Layer
- Authors
- Park, Jaeyoon; Park, Minwoo; Jeong, Unyong
- Issue Date
- Mar-2014
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- MACROMOLECULAR RAPID COMMUNICATIONS, v.35, no.5, pp 560 - 565
- Pages
- 6
- Journal Title
- MACROMOLECULAR RAPID COMMUNICATIONS
- Volume
- 35
- Number
- 5
- Start Page
- 560
- End Page
- 565
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/147343
- DOI
- 10.1002/marc.201300787
- ISSN
- 1022-1336
1521-3927
- Abstract
- This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In2O3 <boxed-text content-type="graphic" position="anchor"> <graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="urn:x-wiley:10221336:media:marc201300787:marc201300787-abs-0001">image</graphic
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