Improvement of Maskless Photolithography of Bio Pattern with Single Crystalline Silicon Micromirror Array
- Authors
- 장윤호; Kook-Nyung Lee; 박재형; 신동식; Yoon-Sik Lee; Yong-Kweon Kim
- Issue Date
- Jun-2007
- Publisher
- 대한전기학회
- Citation
- Journal of Electrical Engineering & Technology, v.2, no.2, pp 274 - 279
- Pages
- 6
- Journal Title
- Journal of Electrical Engineering & Technology
- Volume
- 2
- Number
- 2
- Start Page
- 274
- End Page
- 279
- URI
- https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/148419
- DOI
- 10.5370/JEET.2007.2.2.274
- ISSN
- 1975-0102
2093-7423
- Abstract
- This study focuses on the enhancement of maskless photolithography as well as thepeptide synthesis application with single crystalline silicon micromirrors. A single crystalline silicon micromirror array has been designed and fabricated in order to improve its application to the peptide synthesis. A micromirror rotates about 9 at the pull-in voltage, which can range from 90.7 V to 115.1 V. A 210 m-by-210 m micromirror device with 270 m mirror pitch meets the requirements of an adequately precise separation for peptide synthesis. Synthetic 16 by 16 peptide array corresponds to the same number of micromirrors. The large size of peptide pattern and the separation facilitate biochip experiments using fluorescence assay. The peptide pattern has been synthesized on the GPTS-PEG200 bindings. Hence, an averaged slope at the pattern edge has been distinguishably improved in comparison to patterning results from an aluminum micromirror. .
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