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Initial growth mode of ultrathin Ag films on an Al(111) surface

Authors
Kim, SHSeo, JShin, YKim, WPark, CYOh, SJSeo, JMMin, HGKim, JS
Issue Date
Feb-2001
Publisher
AMER PHYSICAL SOC
Citation
PHYSICAL REVIEW B, v.63, no.8
Journal Title
PHYSICAL REVIEW B
Volume
63
Number
8
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/16678
DOI
10.1103/PhysRevB.63.085414
ISSN
1098-0121
1550-235X
Abstract
The initial growth mode of ultrathin Ag films grown on an Al(111) surface was studied using Auger electron spectroscopy, low-energy electron diffraction (LEED) and x-ray photoelectron spectroscopy. Although Al and Ag have the same fcc bulk structure with nearly the same lattice parameters and a similar homoepitaxial growth mode, the initial growth mode of Ag on an Al(111) surface showed quite an unexpected behavior. As silver was deposited on an Al(111) surface at room temperature, the intensities of LEED spots diminished exponentially up to about 2 monolayer (ML), and the LEED pattern completely disappeared between 2 to 4 ML coverage. After 4 ML thick deposition, (1x1) LEED pattern started to reappear. To explain these experimental results, we propose a growth model of Ag film on the Al(111) surface that incorporates stacking faults induced by an interface alloy formation as observed in our spectroscopic work.
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첨단소재·전자융합공학부 (신소재물리전공)
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