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Thermoelastic switching with controlled actuation in VO2 thin films
- Issue Date
- Mar-2011
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Citation
- SCRIPTA MATERIALIA, v.64, no.6, pp 490 - 493
- Pages
- 4
- Journal Title
- SCRIPTA MATERIALIA
- Volume
- 64
- Number
- 6
- Start Page
- 490
- End Page
- 493
- ISSN
- 1359-6462
- Abstract
- Reversible stress switching across the thermally triggered phase transition in vanadium dioxide thin films grown on silicon has been investigated using in situ wafer curvature measurements. Stability of the recoverable stress, hysteresis width and the transition temperature over 100 cycles are studied. Fine control over the recoverable stress has been demonstrated by thermal arrest across the phase boundary, exploiting the incomplete martensitic transition. Stability of the fractional stress changes across the martensitic transition is reported at various temperatures. (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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Related Researcher
- Ko, Chang Hyun
- 첨단소재·전자융합공학부 (신소재물리전공)