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Ferroelectrically Gated Atomically Thin Transition-Metal Dichalcogenides as Nonvolatile Memory

Authors
Ko, ChanghyunLee, YeonbaeChen, YabinSuh, JoonkiFu, DeyiSuslu, AslihanLee, SangwookClarkson, James DavidChoe, Hwan SungTongay, SefaatinRamesh, RamamoorthyWu, Junqiao
Issue Date
Feb-2016
Publisher
WILEY-V C H VERLAG GMBH
Keywords
2D materials; ferroelectrics; field-effect transistors; nonvolatile memory; transition-metal dichalcogenides
Citation
ADVANCED MATERIALS, v.28, no.15, pp 2923 - 2930
Pages
8
Journal Title
ADVANCED MATERIALS
Volume
28
Number
15
Start Page
2923
End Page
2930
URI
https://scholarworks.sookmyung.ac.kr/handle/2020.sw.sookmyung/3436
DOI
10.1002/adma.201504779
ISSN
0935-9648
1521-4095
Abstract
[No Abstract Available]
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Ko, Chang Hyun
첨단소재·전자융합공학부 (신소재물리전공)
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